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Photonic Crystal Nanocavities with an Average Q factor of 1.9 million Fabricated on a 300-mm-Wide SOI Wafer Using a CMOS-Compatible Process
http://hdl.handle.net/10466/16061
http://hdl.handle.net/10466/160617ae48271-cb61-40da-a061-b8dfda3c34af
名前 / ファイル | ライセンス | アクション |
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2018000237.pdf (931.5 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2018-10-03 | |||||
タイトル | ||||||
タイトル | Photonic Crystal Nanocavities with an Average Q factor of 1.9 million Fabricated on a 300-mm-Wide SOI Wafer Using a CMOS-Compatible Process | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | photonic crystal | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | SOI wafer | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | photolithography | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | resonator | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | fabrication process | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Ashida, Kohei
× Ashida, Kohei× Okano, Makoto× Yasuda, Takamasa× Ohtsuka, Minoru× Seki, Miyoshi× Yokoyama, Nobuyuki× Koshino, Keiji× Yamada, Koji× Takahashi, Yasushi |
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著者別名 | ||||||
姓名 | 髙橋, 和 | |||||
引用 | ||||||
内容記述タイプ | Other | |||||
内容記述 | Journal of Lightwave Technology. 2018, 36 (20), p.4774-4782 | |||||
書誌情報 |
Journal of Lightwave Technology 巻 36, 号 20, p. 4774-4782, 発行日 2018-08-27 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0733-8724 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.1109/JLT.2018.2861894 | |||||
権利 | ||||||
権利情報 | © 2018 IEEE | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
出版者 | ||||||
出版者 | IEEE, OSA Publishing | |||||
資源タイプ | ||||||
内容記述タイプ | Other | |||||
内容記述 | Article |